发明名称 High intensity photo-irradiation device for semiconductor device manufacturing apparatus, has support with hole to hold metal rod on dielectric inner and outer pipes so that rod is placed on two ends of barrier lamp
摘要 The metal rod of dielectric inner pipe (12) which has outer diameter less than inner diameter, is inserted into inner pipe (12) of dielectric barrier lamp. The lamp has discharge space filled with noble gas. Both ends of dielectric inner and outer pipes of lamp (1) are sealed. The support with hole holds the rod so that rod is supported at both ends of lamp. The dielectric inner and outer pipes are configured concentrically. The inside electrode is provided to the dielectric inner pipe (12) which is provided over dielectric outer pipe (11). Specific AC is applied between ground and inner electrodes.
申请公布号 DE10004133(A1) 申请公布日期 2000.10.05
申请号 DE20001004133 申请日期 2000.01.31
申请人 ORC MANUFACTURING CO., LTD. 发明人 ADACHI, NOBUO;OKUGI, YASUHIKO
分类号 H01J65/00;H01J65/04;(IPC1-7):H01J65/04 主分类号 H01J65/00
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