| 摘要 |
The disclosure relates to apparatus, positioned at an inlet port (114) to a pump (110), for shielding the pump from a process chamber (102) of a semiconductor wafer processing system (100), where the apparatus has a variable effective throughput area. Specifically, the apparatus is a restrictor shield (112) containing a mounting ring (200), a shield portion (202) and an actuator (204) which provides a first effective throughput area during processing and a second effective throughput area during bakeout, where the first effective throughput area is typically less than the second effective throughput area. The selection of the effective throughput area is directly responsive to the temperature within the process chamber. <IMAGE> |
