| 摘要 |
A deaerating apparatus is disclosed. The deaerating apparatus can sufficiently remove gases contained in resist solution, developing solution, solvent, and so forth. The deaerating apparatus comprises at least one liquid flow path for allowing the liquid to flow, at least one gas flow path, disposed adjacent to the liquid flow path, for allowing the gas to flow, at least one film member, disposed between the liquid flow path and the gas flow path, for allowing the gas contained in the liquid to permeate, and an exhausting apparatus for exhausting the gas from the gas flow path. While a liquid is being flowed in the liquid flow path, when the exhausting unit is operated, the gas contained in the liquid that flows in the liquid flow path permeates to the film member. The gas is exhausted through the gas flow path.
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