发明名称 |
Alcohol based precursors for producing nanoporous silica thin films |
摘要 |
The invention relates to nanoporous dielectric films and to a process for their manufacture. Such films are useful in the production of integrated circuits. Such films are produced from a precursor of an alkoxysilane; a relatively low volatility solvent composition comprising a e C1 to C4 alkylether of a C1 to C4 alkylene glycol which is miscible in water and alkoxysilanes, having a hydroxyl concentration of 0.0084 mole/cm3 or less, a boiling point of about 175 DEG C. or more at atmospheric pressure and a weight average molecular weight of about 120 or more; a relatively high volatility solvent composition having a boiling point below that of the relatively low volatility solvent composition; optional water and an optional catalytic amount of an acid.
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申请公布号 |
US6126733(A) |
申请公布日期 |
2000.10.03 |
申请号 |
US19980111081 |
申请日期 |
1998.07.07 |
申请人 |
ALLIEDSIGNAL INC. |
发明人 |
WALLACE, STEPHEN;DRAGE, JAMES;RAMOS, TERESA;SMITH, DOUGLAS M. |
分类号 |
C01B33/12;C07F7/04;C08G77/06;C08L83/04;C09D5/25;C09D183/04;H01L21/316;(IPC1-7):C09D103/00 |
主分类号 |
C01B33/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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