发明名称 MICROWAVE PLASMA TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To enhance the uniformity of plasma density. SOLUTION: The upper part of a treating chamber having a circular contour viewed in the plane is covered with a dielectric microwave introducing board, and microwaves are introduced into the treating chamber via the microwave introducing board, so that plasma is generated in the treating chamber. The introduced microwaves propagate along the boundary between the microwave introducing board and the plasma as surface waves. In contact with the main face opposite to the treating chamber of the microwave introducing board, a conductor board 60 is arranged. The conductor board 60 is provided with plural linear projections 21 extensively present in the radial direction and arranged at equal intervals in the circumferential direction. The thickness of the conductor board 60 is set to the one equal to or above the skin depth of the surface waves. In this way, among the numberless modes of the surface waves, a mode having knots among the linear projections 21 selectively propagate. Since there is selectivity in the mode, the uniformity of the plasma density enhances.
申请公布号 JP2000273646(A) 申请公布日期 2000.10.03
申请号 JP19990079692 申请日期 1999.03.24
申请人 SUMITOMO METAL IND LTD 发明人 MITSUHIRA NORIYUKI;SUGAI HIDEO
分类号 H01L21/302;C23C16/511;H01L21/3065;H01L21/31;H05H1/46 主分类号 H01L21/302
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