Alkylated aminoalkylpiperazine surfactants and their use in photoresist developers

摘要

This invention provides water-based compositions, particularly coating, ink, fountain solution, adhesive, agricultural and photoresist developing/electronics cleaning compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain alkylated aminoalkylpiperazine compounds of the structure where one of R1 and R2 is a C5-C14 alkyl or cycloalkyl group and the other is H, or both or R1 and R2 are C5 to C8 alkyl groups, and n is 2 or 3.