发明名称
摘要 <p>PROBLEM TO BE SOLVED: To provide a wafer holder suitable for an automatic transfer of a wafer. SOLUTION: A wafer holder 6 which holds a wafer when a CVD film is formed on the surface of the wafer 2 is equipped with a wafer holder main body 6a provided with a flat surface and pawls 7 provided along the periphery of the wafer 2 on the flat surface of the wafer holder main body 6a. The wafer 2 held by stepped parts 7a provided in the pawls 7 is levitated up from the flat surface of the wafer holder main body 6a so as to provide a gap between the wafer 2 and the flat surface of the wafer holder main body 6a for inserting a wafer transfer arm 4.</p>
申请公布号 JP3093198(B2) 申请公布日期 2000.10.03
申请号 JP19990121521 申请日期 1999.04.28
申请人 发明人
分类号 H01L21/683;H01L21/205;H01L21/22;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
代理机构 代理人
主权项
地址