发明名称 Process depending on plasma discharges sustained by inductive coupling
摘要 A process for fabricating a product 28, 119. The process comprises the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a gaseous discharge excited by a high frequency field in which the vector sum of phase and anti-phase capacitive coupled voltages from the inductive coupling structure substantially balances.
申请公布号 US6127275(A) 申请公布日期 2000.10.03
申请号 US19990451633 申请日期 1999.11.30
申请人 FLAMM, DANIEL L. 发明人 FLAMM, DANIEL L.
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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