发明名称 |
Photo-curable resin composition |
摘要 |
A novel photo-curable resin composition. The resin composition capable of providing a cured product having excellent mechanical strength, high dimensional accuracy, and excellent toughness. The resin composition is capable of providing a cured product which experiences little change in mechanical strength over time. The resin composition is capable of forming, by photo-fabricating, a three-dimensional object which can be used for a long period of time in a humid atmosphere. The composition comprises, (A) an epoxy compound having a cyclohexene oxide, (B) a cationic photo-initiator, (C) an ethylenically unsaturated monomer, (D) a radical photo-initiator, and (E) a polyol.
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申请公布号 |
US6127085(A) |
申请公布日期 |
2000.10.03 |
申请号 |
US19970953633 |
申请日期 |
1997.10.17 |
申请人 |
DSM N.V.;JSR CORPORATION;JAPAN FINE COATINGS CO., LTD |
发明人 |
YAMAMURA, TETSUYA;WATANABE, TSUYOSHI;TAKEUCHI, AKIRA;UKACHI, TAKASHI |
分类号 |
G03F7/004;C08F2/50;C08L63/00;G03F7/00;G03F7/027;G03F7/028;G03F7/029;G03F7/038;(IPC1-7):G03F7/16 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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