发明名称 Gas seal and support for rotating semiconductor processor
摘要 A rotating wafer processor uses a non-contacting gas seal mounted to a process chamber and a vibration isolation mount between the chamber and a support structure. The non-contacting seal incorporates a housing with a chamfer on opposing ends of an annular land encircling a rotating drive shaft, and one or more outlet ports on the chamfers to form a gas-purged, noncontacting seal. The seal is directly mounted to the chamber and interposed between the chamber and bearings that support the drive shaft, so the shaft, chamber and rotating load vibrate together.
申请公布号 US6125551(A) 申请公布日期 2000.10.03
申请号 US19980040176 申请日期 1998.03.17
申请人 VERTEQ, INC. 发明人 BUSHONG, JAMES R. C.;MANRIQUEZ, MARIO S.
分类号 H01L21/00;(IPC1-7):F26B5/08 主分类号 H01L21/00
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