| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a device for treating waste gas, especially semiconductor production waste gas, inexpensive in runing cost and capable of improving the maintenance property of devices to be used. SOLUTION: In the waste gas treating method and device in which harmful components are removed by allowing the waste gas 11 containing the components having oxidizing properties to come in contact with the washing liq. 12 in which pH is adjusted with an alkali agent and also a reducing agent is added, a suitable amount of the reducing agent is previously mixed to the alkali agent and added to the washing liq. 12. The device having the washing tank 2 in which the washing liq. 12 in which pH is adjusted with the alkali agent and also the reducing agent is added is stored and in which the washing liq. 12 is brought into contact with the waste gas 11 containing the component having oxidizing properties has preferably the means in which a suitable amount of the reducing agent is previously mixed to the alkali agent and added.</p> |
