发明名称 |
LIQUID SOURCE SUPPLYING SYSTEM AND ITS WASHING METHOD AND VAPORIZER |
摘要 |
<p>PROBLEM TO BE SOLVED: To enable an operator to know an adequate time for maintenance and a state of a supply source. SOLUTION: This liquid supply system has a pump 2 for delivering the liquid to be supplied with a high pressure and a vaporizer 6 for vaporizing the liquid delivered by this pump 2, vaporizes the liquid by the vaporizer 6 and introduces the vapor into a reaction chamber. A route arriving at the vaporizer 6 from the pump 2 is provided with a pressure gage 7 and is provided with a monitor device 8 for displaying the pressure in accordance with the output of this pressure gage 7.</p> |
申请公布号 |
JP2000271471(A) |
申请公布日期 |
2000.10.03 |
申请号 |
JP19990079380 |
申请日期 |
1999.03.24 |
申请人 |
NIPPON M K S KK |
发明人 |
ARAI MAYUMI;YAMAZAKI TOSHIYUKI |
分类号 |
B01J7/00;B08B9/02;(IPC1-7):B01J7/00 |
主分类号 |
B01J7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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