发明名称 LIQUID SOURCE SUPPLYING SYSTEM AND ITS WASHING METHOD AND VAPORIZER
摘要 <p>PROBLEM TO BE SOLVED: To enable an operator to know an adequate time for maintenance and a state of a supply source. SOLUTION: This liquid supply system has a pump 2 for delivering the liquid to be supplied with a high pressure and a vaporizer 6 for vaporizing the liquid delivered by this pump 2, vaporizes the liquid by the vaporizer 6 and introduces the vapor into a reaction chamber. A route arriving at the vaporizer 6 from the pump 2 is provided with a pressure gage 7 and is provided with a monitor device 8 for displaying the pressure in accordance with the output of this pressure gage 7.</p>
申请公布号 JP2000271471(A) 申请公布日期 2000.10.03
申请号 JP19990079380 申请日期 1999.03.24
申请人 NIPPON M K S KK 发明人 ARAI MAYUMI;YAMAZAKI TOSHIYUKI
分类号 B01J7/00;B08B9/02;(IPC1-7):B01J7/00 主分类号 B01J7/00
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