| 摘要 |
PROBLEM TO BE SOLVED: To obtain an arch-like or ring-like irradiation beam by providing a scattering device, which checks diffusion of irradiation beam to a projection system with which the pattern image of a mask in a lithography projection system is irradiated on a substrate and forming a fan-like curved line by reflecting a fine collimated incident beam. SOLUTION: In a lithography projection system, for example, for ultraviolet light of wavelength of 13 nm is generated by an undulater 10 of an electron storage ring. The reflection light is collected by a first repeapting mirror 13, and the image of a constriction part of a light source is formed in an intermediate plane. In the intermediate plane, a first scattering mirror 14 is provided and increases the diffusion of irradiated light beam inside at least one plane. A second repeating mirror 15 forms the image of a first scattering mirror image on an incident pupil 18 in a projection system of a lithography system. A second scattering mirror 16 folds the projection beam and sends it onto a mask 17 and further increases the diffusion of reflected light beam. The second scattering mirror can be combined with the second repeating mirror. |
