发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL FOR LASER LIGHT EXPOSURE
摘要 PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material for laser light exposure which does not cause irregular density due to interference fringes even when the material is exposed to laser light in a mode of a single spectral number of laser light and which has excellent picture quality. SOLUTION: This heat developable photosensitive material for laser exposure contains photosensitive silver halide particles, org. silver salt, reducing agent and binder on a supporting body, and is exposed to laser light in a mode with a single spectral number of laser light and subjected to heat development to produce a visible image. The photosensitive material has the following features. The photosensitive silver halide particles in the photosensitive material have 0.0001 to 0.2μm average particle size, the proportion of silver applied in the photosensitive silver halide is 0.01 to 1 g per 1 m2 of the supporting body, and the visible image shows 2.0 to 3.7 gamma.
申请公布号 JP2000267220(A) 申请公布日期 2000.09.29
申请号 JP19990073958 申请日期 1999.03.18
申请人 FUJI PHOTO FILM CO LTD 发明人 TOTANI ICHIZO
分类号 G03C1/498;G03C1/76;(IPC1-7):G03C1/498 主分类号 G03C1/498
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