EXPOSING METHOD AND DEVICE THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an exposing method and a device therefor by which a dimensional difference and a level difference are prevented from occurring at the joint part of fields and exposing time is prevented from getting long. SOLUTION: This device is provided with a discontinuous exposing means performing exposure at the scanning finish position of the field exposed by first scanning discontinuously and exposure at the scanning start position of the field exposed by the next scanning after moving a substrate to be exposed 24 discontinuously in the case of exposing the joint part by superposing the scanning finish position of the field exposed by the first scanning on the scanning start position of the field exposed by the next scanning after moving the substrate 24. Therefore, the exposure by the first scanning and the exposure by the next scanning are averaged at the joint part and the dimensional difference and the level difference are prevented from occurring at the joint part.