发明名称 ELECTRODE STRUCTURE, MANUFACTURE THEREOF AND SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an electrode structure with which the parasitic resistance between it and its base can be reduced, the manufacture thereof and a semiconductor light emitting device capable of using high frequencies. SOLUTION: This electrode structure has a conductive film 24c formed on a base substrate 10 via an insulation film. The insulation film has polyimide posts 36, a first film 38 which is formed on the side faces of the posts 36 and made of an insulation material harder than the polyimide, and a second polyimide film 40 embedded among the posts 36 with the film 38 formed on the side faces.</p>
申请公布号 JP2000269591(A) 申请公布日期 2000.09.29
申请号 JP19990073500 申请日期 1999.03.18
申请人 FUJITSU QUANTUM DEVICE KK 发明人 OSAKA SHIGEO;DOMOTO SHINICHI;OKADA NOBUMASA
分类号 H01S5/00;H01L21/60;H01S5/02;H01S5/042;(IPC1-7):H01S5/042 主分类号 H01S5/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利