发明名称 |
ELECTRODE STRUCTURE, MANUFACTURE THEREOF AND SEMICONDUCTOR LIGHT EMITTING DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electrode structure with which the parasitic resistance between it and its base can be reduced, the manufacture thereof and a semiconductor light emitting device capable of using high frequencies. SOLUTION: This electrode structure has a conductive film 24c formed on a base substrate 10 via an insulation film. The insulation film has polyimide posts 36, a first film 38 which is formed on the side faces of the posts 36 and made of an insulation material harder than the polyimide, and a second polyimide film 40 embedded among the posts 36 with the film 38 formed on the side faces.</p> |
申请公布号 |
JP2000269591(A) |
申请公布日期 |
2000.09.29 |
申请号 |
JP19990073500 |
申请日期 |
1999.03.18 |
申请人 |
FUJITSU QUANTUM DEVICE KK |
发明人 |
OSAKA SHIGEO;DOMOTO SHINICHI;OKADA NOBUMASA |
分类号 |
H01S5/00;H01L21/60;H01S5/02;H01S5/042;(IPC1-7):H01S5/042 |
主分类号 |
H01S5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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