| 摘要 |
A high-performance projection exposure apparatus excellent in durability and reproducibility, which can adjust optical characteristics which are rotationally asymmetric with respect to the optical axis of projection optical system and which remain in the projection optical system. The projection exposure apparatus comprises an illumination optical system, a projection optical system and an optical means. The illumination optical system illuminate a first object, and the projection optical system projects an image of the first object onto a second object under a predetermined magnification. The optical means is set between the first object and the second object, and has rotationally asymmetric powers with respect to an optical axis of the projection optical system. Consequently, the optical means can correct an optical characteristic rotationally asymmetric with respect to the optical axis of the projection optical system, remaining in the projection optical system. |
