| 摘要 |
A plurality of recesses (101) are formed by etching in the center of a quartz plate (100) obtained by polishing an electronic material such as a quartz plate, silicon or gallium arsenide by using a double-side polishing machine, single-side polishing machine or other polishing machines, a chemical etching such as an RIE is conducted from a side opposite to the recess-formed surface of the quartz plate to remove about several tens of mu m, and then irregularities of several mu m produced by a chemical etching such as an RIE, a dry etching such as an ion milling or a plasma etching or a chemical wet etching are again polished by using a double-side polishing machine, single-side polishing machine, float polishing machine or other polishing machine to form a convex lens-form oscillation portion on a plane side opposite to the recesses. |
