发明名称 VACUUM ARC EVAPORATION METHOD, VACUUM ARC EVAPORATION SYSTEM, AND ROTARY CUTTING TOOL
摘要 <p>A vacuum arc evaporation method, a vacuum arc evaporation system and a rotary cutting tool, wherein a hard thin film can be formed that is superior both in adhesion to a base material and in surface roughness. The rotary cutting tool comprises a vacuum chamber (1) provided with an auxiliary chamber (3) that is less likely to be evacuated than a film forming chamber (2), an arc type evaporation source (4) installed in the auxiliary chamber (3), wherein a gas, such as nitrogen gas, is introduced into the auxiliary chamber (3) from a gas introducing portion (6) during the cleaning of a base material (10) prior to film formation and the gas pressure in the auxiliary chamber (3) is kept higher than that around the base material, and the generation of molten particles is suppressed without aggravating the sputter effect when the cathode (evaporation material) of the arc evaporation source (4) is melted for ionization, thereby providing a rotary cutting tool whose surface roughness is low.</p>
申请公布号 WO2000056947(P1) 申请公布日期 2000.09.28
申请号 JP2000001618 申请日期 2000.03.16
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