发明名称 RESIN MATERIAL FOR GAS SEPARATION BASE AND PROCESS FOR PRODUCING THE SAME
摘要 A resin material for gas separation bases which has a cardo-type polymer structure in which at least 0.1% of the hydrogen atoms of the pendant benzyl and/or allyl groups have been replaced by a halogen or a resin material for gas separation bases which comprises a polymer in which at least 34% of the hydrogen atoms of the pendant benzyl and/or allyl groups have been replaced by a halogen; the polymer constituting the resin material for gas separation bases which has the cardo-type polymer structure; and a process for producing the polymer. The resin material not only is excellent in solvent solubility, easiness of film formation by a wet process, thermal stability, chemical stability, etc., but has better performances with respect to gas permeability and gas selectivity. Thus, a gas separation base, especially a gas separation membrane, can be produced in which gas permeability and gas selectivity can be easily controlled.
申请公布号 WO0056430(A1) 申请公布日期 2000.09.28
申请号 WO2000JP01751 申请日期 2000.03.22
申请人 JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY;RESEARCH INSTITUTE OF INNOVATIVE TECHNOLOGY FOR THE EARTH;NIPPON STEEL CORPORATION;SUMITOMO ELECTRIC INDUSTRIES, LTD.;TACHIKI, AKIRA;MANO, HIROSHI;HARAYA, KENJI 发明人 TACHIKI, AKIRA;MANO, HIROSHI;HARAYA, KENJI
分类号 B01D53/22;B01D71/24;B01D71/44;B01D71/52;B01D71/56;B01D71/64;B01D71/68;B01D71/82;C08G73/10;(IPC1-7):B01D67/00;C08J5/18 主分类号 B01D53/22
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