发明名称 |
RESIN MATERIAL FOR GAS SEPARATION BASE AND PROCESS FOR PRODUCING THE SAME |
摘要 |
A resin material for gas separation bases which has a cardo-type polymer structure in which at least 0.1% of the hydrogen atoms of the pendant benzyl and/or allyl groups have been replaced by a halogen or a resin material for gas separation bases which comprises a polymer in which at least 34% of the hydrogen atoms of the pendant benzyl and/or allyl groups have been replaced by a halogen; the polymer constituting the resin material for gas separation bases which has the cardo-type polymer structure; and a process for producing the polymer. The resin material not only is excellent in solvent solubility, easiness of film formation by a wet process, thermal stability, chemical stability, etc., but has better performances with respect to gas permeability and gas selectivity. Thus, a gas separation base, especially a gas separation membrane, can be produced in which gas permeability and gas selectivity can be easily controlled.
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申请公布号 |
WO0056430(A1) |
申请公布日期 |
2000.09.28 |
申请号 |
WO2000JP01751 |
申请日期 |
2000.03.22 |
申请人 |
JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY;RESEARCH INSTITUTE OF INNOVATIVE TECHNOLOGY FOR THE EARTH;NIPPON STEEL CORPORATION;SUMITOMO ELECTRIC INDUSTRIES, LTD.;TACHIKI, AKIRA;MANO, HIROSHI;HARAYA, KENJI |
发明人 |
TACHIKI, AKIRA;MANO, HIROSHI;HARAYA, KENJI |
分类号 |
B01D53/22;B01D71/24;B01D71/44;B01D71/52;B01D71/56;B01D71/64;B01D71/68;B01D71/82;C08G73/10;(IPC1-7):B01D67/00;C08J5/18 |
主分类号 |
B01D53/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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