发明名称 |
Vaporizing device for CVD apparatus |
摘要 |
<p>A vaporizing device for CVD source materials comprising: a vaporizer (8) for vaporizing introduced CVD source materials through heating, a spray nozzle (7) the end portion of which is fixedly attached to the vaporizer (8) for spraying the CVD source materials into the vaporizer (8), a cooling mechanism (19, 20) for cooling the spray nozzle (7), and heat conduction restricting means (21) attached either to a fixing portion (25), or provided proximate to a fixing portion of the spray nozzle (7) or the vaporizer (8). The effect can be achieved that generation of non-vaporized residues and particles can be decreased and that improvements in productivity owing to elongation of continuous operation time and decrease in film forming deficiencies can be achieved. <IMAGE></p> |
申请公布号 |
EP1038988(A2) |
申请公布日期 |
2000.09.27 |
申请号 |
EP20000106247 |
申请日期 |
2000.03.22 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
MATSUNO,SHIGERU;SATO,TAKEHIKO;YAMADA,AKIRA;TARUTANI,MASAYOSHI;YAMAMUKA,MIKIO;HORIKAWA,TSUYOSHI;KAWAHARA,TAKAAKI;UCHIKAWA, FUSAOKI |
分类号 |
H01L21/31;B01J7/02;C23C16/44;C23C16/448;(IPC1-7):C23C16/44 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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