发明名称 Utilization of die repattern layers for die internal connections
摘要 The formation of routing traces on an external surface of a semiconductor device, such as a flip-chip, which has a plurality of ball or bump sites patterned in specific locations, wherein the ball or bumps sites are in electrical communication with external communication traces which are used to route signals from the flip-chip integrated circuitry. Such external communication traces generally result in unused space on the exterior surface of the flip-chip. This unused space can be utilized for forming routing traces to connect portions of the internal circuitry of the flip-chip rather than forming such routing traces internally, for forming routing traces to connect two or more semiconductor dice, or for forming routing traces for use as repair mechanisms.
申请公布号 US6124195(A) 申请公布日期 2000.09.26
申请号 US19990287456 申请日期 1999.04.07
申请人 MICRON TECHNOLOGY, INC. 发明人 DUESMAN, KEVIN G.;FARNWORTH, WARREN M.
分类号 H01L23/525;(IPC1-7):H01L21/44 主分类号 H01L23/525
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