发明名称 Centrifugal wafer processor and method
摘要 A dryer for processing semiconductor substrates which rotates a carrier containing the substrates within a housing in combination with a bubbler which heats and directs a gas containing a water tension reducing vapor to the housing to contact the substrates and thereby hasten drying, decrease water marking, and decrease contamination.
申请公布号 US6122837(A) 申请公布日期 2000.09.26
申请号 US19980103930 申请日期 1998.06.24
申请人 VERTEQ, INC. 发明人 OLESEN, MICHAEL B.;BRAN, MARIO E.
分类号 H01L21/00;(IPC1-7):F26B5/08 主分类号 H01L21/00
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