发明名称 |
Centrifugal wafer processor and method |
摘要 |
A dryer for processing semiconductor substrates which rotates a carrier containing the substrates within a housing in combination with a bubbler which heats and directs a gas containing a water tension reducing vapor to the housing to contact the substrates and thereby hasten drying, decrease water marking, and decrease contamination.
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申请公布号 |
US6122837(A) |
申请公布日期 |
2000.09.26 |
申请号 |
US19980103930 |
申请日期 |
1998.06.24 |
申请人 |
VERTEQ, INC. |
发明人 |
OLESEN, MICHAEL B.;BRAN, MARIO E. |
分类号 |
H01L21/00;(IPC1-7):F26B5/08 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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