发明名称 GAS TREATMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for treating gas by which exhaust gas containing organic gas such as gas of an organic solvent is decomposed efficiently, easily and at low cost and removed by the other method. SOLUTION: Ascending gas 2 to be treated and descending gas-treating liquid 1 are subjected to gas-liquid contact with each other in the inside of a gas treatment tower. In this case, a part (branch gas) 3' of the gas to be treated is preliminarily mixed with the gas treatment liquid 1 and is supplied to the gas treatment tower 5. After gas-liquid contact in the inside of the tower, a gas component dissolved in the treatment liquid is decomposed or removed preferably by using a microbiological treatment method. Thereby, the gas to be treated can be extremely efficiently treated.</p>
申请公布号 JP2000262846(A) 申请公布日期 2000.09.26
申请号 JP19990067889 申请日期 1999.03.15
申请人 FUJI PHOTO FILM CO LTD 发明人 NARUSE YASUTO
分类号 B01D53/44;B01D53/77;B01J10/00;C02F3/12;C12M1/00;C12N1/00;(IPC1-7):B01D53/44 主分类号 B01D53/44
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