TRAP DEVICE AND DEVICE FOR PRODUCING SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To enable maintenance for removing a reaction by-product stuck to a trap device without detaching a pipeline of exhaust gas in spite of a straight type. SOLUTION: An opening 14 is formed in a wall on one side of the nearly square trap device 10. A cover 15 is freely detachably fitted to the opening 14 not parallel to the axis of the trap device 10, but in the rectangular direction. The cover 15 is provided with a pipeline 17 of cooling water on which a reaction by-product contained in exhaust gas is stuck, and with an N2-gas-purging port 20 for purging N2 gas into the trap device 10.