| 摘要 |
PROBLEM TO BE SOLVED: To restrain the decomposition of ozone in washing liquid to maintain uniform washing power for a long time to uniformly wash a substrate in a method of washing the substrate for electronic equipment by using a washing solution in which ozone and gases showing acidity are dissolved in pure water. SOLUTION: To a pipeline 33 connecting an ultrapure water tank 35 and a treating tank 32, a device 36 for feeding ozone and a device 37 for feeding gas showing acidity are connected. Ultrapure water is fed to the treating tank 32 from the ultrapure water tank 35, and ozone and gas showing acidity are fed to the ultrapure water from the device 36 for feeding ozone and the device 37 for feeding gas showing acidity to dissolve them therein to obtain washing liquid. A substrate 31 is immersed in the washing liquid with which the treating tank 32 is filled, and is shaken and soaked therein by an ultrasonic vibrator transducer 34 to wash the substrate. Since the washing liquid can maintain high washing power for a long time and the ozone concentration in the treating tank is made uniform in this way, the substrate can be washed more cleanly and more uniformly.
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