| 摘要 |
An exposure device in which relative alignment between first and second objects is conducted by using an alignment and in which a pattern on the first object is exposed onto the second object to form the pattern on the first object onto the second object. The exposure device includes a mark detecting device for detecting an actual position of the alignment and for producing a detection signal, a moving device for moving the first and second objects relative to each other to perform alignment of the first and second objects and a control device for storing a positional error of the alignment mark generated when the alignment mark is formed on the second object and for controlling the alignment of the first and second objects by the moving device in accordance with the positional error and the detection signal obtained by the mark detecting device. Also disclosed is a mask producing method, an exposure method and semiconductor device producing methods that include related features.
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