发明名称 PRODUCTION MANAGEMENT METHOD, DESIGN METHOD OF PRODUCTION LINE AND PRODUCTION LINE
摘要 <p>PROBLEM TO BE SOLVED: Not to influence an obstruction generated in a device of one step to other step by ensuring a safety device number corresponding to an article number lacking at a subsequent step by a stopping of a device of one step and further, ensuring an empty shelf corresponding to the article number staying at the stopping of a device. SOLUTION: A production line of an FET base plate includes steps P1-P9 and devices E1-E4 processes steps P2, P5, P8. Among them, step P2 is processed by devices E1 and E2 whereas the step P5 uses all of the devices E1-E4. Here, the steps P1, P4, P7 correspond to a film forming step and the step P2, P5, P8 correspond to a photo step and further, the step P3, P6, P9 correspond to the etching steps. Thereby, the FET base plate is processed. Immediately after step P1, a production line is managed so as to ensure a safety device number. Immediately before step P1, an empty shelf corresponding to an yield of step P1 is ensured. Thereby, it is avoided that an influence of the stopping of the device at the step P1 is affected to other step and a preparation through put can be maximized.</p>
申请公布号 JP2000263388(A) 申请公布日期 2000.09.26
申请号 JP19990072665 申请日期 1999.03.17
申请人 FUJITSU LTD 发明人 WATANABE KAZUHIRO;WATASHIRO MINEO;KITANO MASARU;OTA YUICHIRO;MIYAZAKI KATSUYUKI;TANAKA HIROICHI;ISHII HIDEO
分类号 B23Q41/08;G05B19/418;G09F9/35;H01L21/02 主分类号 B23Q41/08
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