发明名称 PRODUCTION OF SYNTHETIC QUARTZ
摘要 PROBLEM TO BE SOLVED: To stably produce a synthetic quartz in high quality over a long period while preventing the deposition of coarse particles by forming glass soot by the hydrolysis or vapor-phase oxidization of a raw material gas carried by a carrier gas having a water content lower than a specific level and depositing the formed glass soot on a starting member. SOLUTION: The raw material gas for the present process is produced by bubbling and evaporating a liquid raw material gas with a carrier gas controlled by a precision flow controlling device and carrying the vapor with the carrier gas or by heating and evaporating a liquid raw material with an evaporator, etc., and carrying the vapor with a carrier gas. The carrier gas is argon, helium, oxygen, hydrogen, etc., purified by an ultra-high purity refining device to decrease the water content to <=10μg/L. The raw material gas is supplied to a reactor to effect the vapor-phase hydrolysis in an oxyhydrogen flame or the vapor-phase oxidation with oxygen gas and the formed glass soot is deposited on the starting member to produce a synthetic quartz.
申请公布号 JP2000264648(A) 申请公布日期 2000.09.26
申请号 JP19990065825 申请日期 1999.03.12
申请人 SHIN ETSU CHEM CO LTD 发明人 KOIDE HIROYUKI;HATAYAMA KAZUHISA;SHIMADA TADAKATSU;HIRASAWA HIDEO
分类号 C03B8/04;C03B20/00;C03B37/014;C03B37/018;(IPC1-7):C03B8/04 主分类号 C03B8/04
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