| 发明名称 |
Method and apparatus for achieving temperature uniformity of a substrate |
| 摘要 |
A method for controlling the temperature of a substrate in a processing chamber. The processing chamber employs a heating control over at least two heating zones. Each heating zone is independently controllable according to a measured signal corresponding to the substrate temperature and a user-definable offset.
|
| 申请公布号 |
US6123766(A) |
申请公布日期 |
2000.09.26 |
| 申请号 |
US19970872123 |
申请日期 |
1997.05.16 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
WILLIAMS, MEREDITH J.;BALLANCE, DAVID S.;BIERMAN, BENJAMIN;DEATON, PAUL;HAAS, BRIAN;TAKAHASHI, NOBUYUKI;TIETZ, JAMES V. |
| 分类号 |
C23C16/46;C30B25/10;C30B25/16;(IPC1-7):C30B25/16 |
主分类号 |
C23C16/46 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
