发明名称 Semiconductor circuit having a crystal growth in an active layer where a specific distance is established between a selected portion and where the growth starts to the active layer of the circuit
摘要 In a semiconductor circuit using a silicon film in which crystals grow in the direction parallel to a substrate, the distance between the position of a starting region of crystal growth and the position of the respective active layers are made the same. Thus, the difference of the characteristics due to the difference of the distance of crystal growth is corrected.
申请公布号 US6124602(A) 申请公布日期 2000.09.26
申请号 US19970998969 申请日期 1997.12.29
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 OHTANI, HISASHI;KOYAMA, JUN;OGATA, YASUSHI;YAMAZAKI, SHUNPEI
分类号 H01L21/20;H01L21/336;H01L21/77;H01L21/8238;H01L21/84;H01L27/08;H01L27/092;H01L29/04;H01L29/786;(IPC1-7):H01L29/00 主分类号 H01L21/20
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