发明名称 |
WAFER CONVEYER, WAFER POLISHER AND MANUFACTURE OF WAFER |
摘要 |
PROBLEM TO BE SOLVED: To provide a wafer conveyer and a wafer polisher, which can mount/ demount a wafer accurately stably in a wafer hold head also efficiently polish the wafer, and a method of manufacturing the wafer. SOLUTION: This device total unit 1 is provided with a tray part 2 horizontally moved along a guide rail 6 and a wafer mounting/ demounting mechanism 4 set up under a moving direction of this tray part 2. Polishing pads S are arranged in a position in parallel to the guide rail 6. A wafer loaded in the tray part 2 relating to a wafer hold head 50 is mounted by turning a head drive part 51, opposing the wafer mounting/demounting mechanism 4 and the wafer hold head 50, also moving the tray part 2 under the wafer hold head 50, and lifting the wafer by the wafer mounting/demounting mechanism 4. |
申请公布号 |
JP2000263433(A) |
申请公布日期 |
2000.09.26 |
申请号 |
JP19990069336 |
申请日期 |
1999.03.15 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
KOBAYASHI TATSUNOBU;KAJIWARA JIRO |
分类号 |
B24B37/04;H01L21/304;H01L21/677;H01L21/68 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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