PHOTOMASK, METHOD FOR MANUFACTURING THE PHOTOMASK, METHOD FOR TESTING AND CORRECTING THE PHOTOMASK, AND METHOD FOR USING THE PHOTOMASK

摘要

PURPOSE: A photomask provides the photomask at a low price by preventing a throughput of an apparatus for electron beam exposure from being degraded, and to increase a precision of the photomask by preventing an error of a length from increasing. CONSTITUTION: A photomask(1) comprises a transparent substrate(2) and a light shielding pattern(3b). The light shielding pattern exhibits a circuit pattern of a polygon including an inclined line as a polygon in which the inclined line is indicated as a shape of a step by a plurality of rectangles. The width(R) of the rectangle is as follows. Rw is not greater than R and R is not greater than Rp multiplied by m, in which m is a transcription magnification of an exposure apparatus, Rp is a resolution of the exposure apparatus, and Rw is a resolution of an apparatus for a mask drawing.