CHEMICAL SUPPLYING PUMP, CHEMICAL SUPPLYING DEVICE, CHEMICAL SUPPLYING SYSTEM, SUBSTRATE CLEANING DEVICE, CHEMICAL SUPPLYING METHOD, AND SUBSTRATE CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To achieve drastic miniaturization and simplification of a cleaning fluid supplying system including a chemical tank, to easily and quickly prepare and supply cleaning fluid having the accurate chemical density, and to restrain particles from being generated and contaminated in to cleaning fluid. SOLUTION: A chemical supplying system 2 is constituted of a chemical storage tank 21 for storing chemical for cleaning in the stock solution state, a chemical supplying device 22 connected to the chemical storage tank 21 and for actively perform chemical supply, a piping system 23 connected to the chemical supplying device 22 and for forming a supply passage taken as a passage for super pure water to be mixed to chemical, and a pair of discharge nozzles 24, 25 provided on the ends of the piping system 23 so as to face respective front surfaces of a wafer 11 installed in a washing chamber 1 and for supplying cleaning fluid to respective front surfaces.