发明名称 METHOD FOR MANUFACTURING ALUMINUM-GALLIUM-INDIUM STRUCTURE
摘要 PURPOSE: A method for manufacturing an AlxGazInzN structure is provided high quality reflecting surfaces to both sides of AlxGazInzN device by inserting one or two mirror stacks including a dielectric distributed Bragg reflector(D-DBR) between an AlxGazInzN active region and a host substrate. CONSTITUTION: A method for manufacturing an AlxGazInzN structure comprises the steps of: adhering a host substrate to a first mirror stack; forming an AlxGazInzN structure on the sacrificial growth substrate; forming a wafer bond interface; eliminating the sacrificial growth substrate by a laser solution; and depositing an electrical connection point on the AlxGazInzN structure.
申请公布号 KR20000057921(A) 申请公布日期 2000.09.25
申请号 KR20000005426 申请日期 2000.02.03
申请人 AGILENT TECHNOLOGIES INC. 发明人 KOMAN, KERI CARTER;KISWI, FRED A.;KEONALSEUKOTEU;KEURAMESEU, MICHAEL R.;MARTIN, PAUL S.
分类号 H01L33/00;H01L33/10;H01L33/46;H01S5/02;H01S5/183;H01S5/323;(IPC1-7):H01L33/00 主分类号 H01L33/00
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