发明名称 |
METHOD FOR MANUFACTURING ALUMINUM-GALLIUM-INDIUM STRUCTURE |
摘要 |
PURPOSE: A method for manufacturing an AlxGazInzN structure is provided high quality reflecting surfaces to both sides of AlxGazInzN device by inserting one or two mirror stacks including a dielectric distributed Bragg reflector(D-DBR) between an AlxGazInzN active region and a host substrate. CONSTITUTION: A method for manufacturing an AlxGazInzN structure comprises the steps of: adhering a host substrate to a first mirror stack; forming an AlxGazInzN structure on the sacrificial growth substrate; forming a wafer bond interface; eliminating the sacrificial growth substrate by a laser solution; and depositing an electrical connection point on the AlxGazInzN structure.
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申请公布号 |
KR20000057921(A) |
申请公布日期 |
2000.09.25 |
申请号 |
KR20000005426 |
申请日期 |
2000.02.03 |
申请人 |
AGILENT TECHNOLOGIES INC. |
发明人 |
KOMAN, KERI CARTER;KISWI, FRED A.;KEONALSEUKOTEU;KEURAMESEU, MICHAEL R.;MARTIN, PAUL S. |
分类号 |
H01L33/00;H01L33/10;H01L33/46;H01S5/02;H01S5/183;H01S5/323;(IPC1-7):H01L33/00 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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