RESIST PEELING LIQUID AND PEELING METHOD OF RESIST USING THE SAME

摘要

PROBLEM TO BE SOLVED: To obtain a resist peeling liquid with which a resist and residue of a resist can be easily peeled and which can be rinsed only with water without corroding a wiring material or an insulating film by preparing an aq. soln. containing an oxidizing agent, chelating agent and water-soluble fluorine compd. SOLUTION: This liquid consists of an aq. soln. containing an oxidizing agent, a chelating agent and a water-soluble fluorine compd. The oxidizing agent is preferably hydrogen peroxide, and its concn. is controlled to 0.0001 to 60 wt.%. The chelating agent is preferably a phosphonic acid chelating agent, and especially preferably 1,2-propanediamine tetramethylene phosphonic acid. Its concn. is controlled to 0.01 to 5 wt.%. The water-soluble fluorine compd. is preferably ammonium fluoride and its concn. is controlled to 0.001 to 10 wt.%. The peeling liquid is used in 3 to 12 pH range.