| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a transparent electromagnetic shield material at a high productivity which has a high electromagnetic shield property, high transparency and high clearness. SOLUTION: A photosensitive sheet is composed of a bond layer contg. electroless-plating catalyst metal grains or a metal compd. at least on the surface, an electroless metal plating layer, a photo resist layer laminated in this order on the surface of a plastic film, the photo resist layer of the sheet is pattern-exposed and developed, a metal is electroplated on the electroless plating layer only in openings of the resist, and only the resist layer at the resist pattern is simultaneously transferred to a substrate, together with the bond layer. The metal pattern has a line width of 15-40μm and a line pitch of 100-400μm, the bond layer is 0.03-2.5μm thick, the electroless metal plating layer is 0.05-1.0μm thick, and the electroplated metal layer is 2-15μm thick.
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