发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To make an impurity region fine, when a plurality of impurity areas are formed selectively in a semiconductor substrate. SOLUTION: This semiconductor device is provided with a first conductivity collector substrate 1, a plurality of grooved second conductivity base regions 5 at a plurality of points on the surface of the collector substrate 1, one or a plurality of first conductivity emitter regions 8 on surfaces among the base regions 5 on the collector substrate 1, and a diffusion base region 4 which impurities are diffused in a first conductivity region around the grooved the region 5 from the base region 5.
申请公布号 JP2000261000(A) 申请公布日期 2000.09.22
申请号 JP19990066294 申请日期 1999.03.12
申请人 TOSHIBA CORP 发明人 TERAMAE SATOSHI;TSUNODA TETSUJIRO
分类号 H01L29/80;(IPC1-7):H01L29/80 主分类号 H01L29/80
代理机构 代理人
主权项
地址