| 摘要 |
PROBLEM TO BE SOLVED: To obtain a defect inspection apparatus by which an object to be inspected can be inspected with high accuracy without being affected by an irregularity in the film thickness (an irregularity in the color) of an interfering film even when the interfering film is executed to the object to be inspected. SOLUTION: An illumination optical system which illuminates a face to be inspected is provided. In addition, an imaging optical system comprising an imaging element which images the illuminated face to be inspected is provided. In addition, a variable-wavelength means by which light from the face, to be inspected, imaged by the imaging element is changed selectively into band light comprising different center wavelengths is provided. In addition, an image creation means by which pixel data satisfying a prescribed luminance condition is extracted regarding a pixel corresponding to every image obtained by the imaging element by changing a wavelength and which craetes an image constituted of the extracted image data is provided. In addition, a defect detecting means which detects the defect of the face, to be inspected, on the basis of the created image is provided.
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