发明名称 PATTERN INSPECTING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To detect even a pattern equal to or less than one pixel size low in detection sensitivity with high accuracy. SOLUTION: When inspection data obtained by photographing an object to be inspected and reference data are compared with each other to inspect an edge pattern, in a differentiation circuit 25, the respective differential values with respective pixels adjacent to the noticeable pixels on inspection data in the same direction as the edge pattern direction on the reference data and the respective differential values of the pixels adjacent to the noticeable pixels with the pixels leaving one pixel on the side of the direction opposite to those pixels are calculated and these differential values are compared with a preset threshold value by a judge circuit 22 to inspect the edge pattern.
申请公布号 JP2000258350(A) 申请公布日期 2000.09.22
申请号 JP19990056885 申请日期 1999.03.04
申请人 TOSHIBA CORP 发明人 INOUE HIROSHI
分类号 G01N21/88;G01N21/93;G01N21/956;(IPC1-7):G01N21/88 主分类号 G01N21/88
代理机构 代理人
主权项
地址