发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an alignment and blanking mechanism capable of obtaining high speed blanking and high stability of voltage. SOLUTION: While blanking is off, a switch 24S of a switching element 24 becomes off, and voltage applied to an electrode 20A becomes 0 V. Voltage of -2 Va volt or +2 Va volt is applied to an electrode 20B. An electron beam 27 passes through a limit aperture 21 and reaches a target. While blanking is on, the switch 24S of the switching element 24 becomes on, and voltage (2 Vb volt) from a positive power source 22 is applied to the electrode 20A. Voltage of -2 Va volt is applied to an electrode 20B. The electron beam 27 is deflected toward the electrode 20A, and passage of the electron beam 27 in the direction of the target is shut off with the limit aperture 21.
申请公布号 JP2000260382(A) 申请公布日期 2000.09.22
申请号 JP19990064413 申请日期 1999.03.11
申请人 JEOL LTD 发明人 MIYATA TAKAHISA
分类号 H01J37/147;G03F7/20;H01J37/305;H01L21/027;(IPC1-7):H01J37/305 主分类号 H01J37/147
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