发明名称 PLASMA APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma apparatus improved in the evenness of plasma density by eliminating the unevenness of the plasma density due to E×B drift. SOLUTION: Magnets 1a to 1d are disposed near incoming windows of microwave guides 9 for generating plasma, The magnets 1a to 1d are disposed, so that vector product E×B of magnetic-flux density vectors B produced by the magnets 1 and electric-field vectors E produced in the plasma, are oriented in the direction toward an object to be processed or in the extraction direction of an ion beam. and plasma is carried in the direction towards the object to be processed or in the extraction direction of the ion beam.
申请公布号 JP2000260596(A) 申请公布日期 2000.09.22
申请号 JP19990065231 申请日期 1999.03.11
申请人 HITACHI LTD 发明人 HIGUCHI YOSHIYA;KITAZAWA SATOSHI;SEKI HIROBUMI;MORIMOTO YUICHI;NAGAMINE YOSHIHIKO;TAKEMORI SEI;UMEGAKI KIKUO
分类号 H01L21/302;C23C16/50;C23C16/511;H01L21/205;H01L21/3065;H01L21/31;H05H1/46 主分类号 H01L21/302
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