发明名称 MANUFACTURE OF LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide the method capable of manufacturing an active matrix liquid crystal display device with few manufacturing processes and at a low cost by preventing a manufacturing yield from lowering due to release of films. SOLUTION: In this method for manufacturing a liquid crystal display device in which a thin film transistor 21 having a semiconductor film pattern formed by photoetching a high resistivity semiconductor film 4 and a low resistivity semiconductor film 5 and a third metal film 7 being a source metal film layer laminated on the semiconductor film pattern are formed on a glass substrate 1 in a matrix, the semiconductor film pattern in formed, and then the third metal film 7 is laminated on the glass substrate 1 on which the semiconductor film pattern is formed.</p>
申请公布号 JP2000258799(A) 申请公布日期 2000.09.22
申请号 JP19990063830 申请日期 1999.03.10
申请人 SHARP CORP 发明人 SHIMADA YOSHIHIRO
分类号 H01L21/336;G02F1/1343;G02F1/136;G02F1/1362;G02F1/1368;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):G02F1/136;G02F1/134 主分类号 H01L21/336
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