摘要 |
<p>PROBLEM TO BE SOLVED: To provide the method capable of manufacturing an active matrix liquid crystal display device with few manufacturing processes and at a low cost by preventing a manufacturing yield from lowering due to release of films. SOLUTION: In this method for manufacturing a liquid crystal display device in which a thin film transistor 21 having a semiconductor film pattern formed by photoetching a high resistivity semiconductor film 4 and a low resistivity semiconductor film 5 and a third metal film 7 being a source metal film layer laminated on the semiconductor film pattern are formed on a glass substrate 1 in a matrix, the semiconductor film pattern in formed, and then the third metal film 7 is laminated on the glass substrate 1 on which the semiconductor film pattern is formed.</p> |