| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacture method of an aperture grille capable of providing a visible image without generating unevenness of tape pitches even when a lapped tape part is shifted a little in an aperture grille of a lapping structure. SOLUTION: A resist layer is formed on a conductor substrate, and a slit shaped patterning is formed on a center part of the conductor substrate. Then, a tape shaped plating coat of a first layer and a second layer of different coherent frequencies is formed to be a lapping structure on the exposed conductor substrate. In providing an aperture grille by peeling the plating coat from the conductor substrate, plating is provided by using a patterned resist layer formed by laminating resist layers of different slit widths so that the tape-shaped plating coat having the first layer and the second layer of different tape widths is formed.
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