发明名称 PATTERN FORMING METHOD OF CERAMIC SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To form a wide pattern in which imperfect printing due to blur caused by paste scratch when squeegeeing is performed does not exist, while a fine pattern is precisely formed by a positive film burying method. SOLUTION: After a wide pattern 26 is screen-printed on a ceramic green sheet 21a by using a mesh mask 22, green sheets 21a, 21b of the respective layers are laminated and thermally contact-bonded, thereby forming an unbaked ceramic substrate 21. After the ceramic substrate 21 and the wide pattern 26 are baked simultaneously, resist 27 is spread on the surface layer of the ceramic substrate 21, and a resist pattern 27a is formed by a photolithography method. By filling an aperture 49 of the resist pattern 27a with conductor paste, a fine pattern is formed. The surface of the fine pattern is polished and flattened. After that, the resist pattern 27a is eliminated with chemicals, and the fine pattern is baked.
申请公布号 JP2000261127(A) 申请公布日期 2000.09.22
申请号 JP19990064199 申请日期 1999.03.11
申请人 SUMITOMO METAL ELECTRONICS DEVICES INC 发明人 ITAKURA HIDEAKI
分类号 B41F15/08;H05K3/12;(IPC1-7):H05K3/12 主分类号 B41F15/08
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