| 摘要 |
<p>A material for shadow mask having the following composition of components: C ≤ 0.0008 wt.%, Si ≤ 0.03 wt.%, Mn: 0.1 to 0.5 wt.%, P ≤ 0.02 wt.%, S ≤ 0.02 w.%, Al: 0.01 to 0.07 wt.%, N ≤ 0.0030 wt.%, B: an amount satisfying the formula: 5 ppm ≤ B-11/14 x N ≤ 30 ppm, balance: Fe and inevitable impurities; a method for producing the material; a shadow mask using the material (cold rolled steel sheet); and an image receiving tube equipped with the shadow mask. The material has excellent etching characteristics, which are uniform within the same coil, and excellent press formability.</p> |
