发明名称 METHOD AND APPARATUS FOR ARC DEPOSITION
摘要 <p>A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant (12); introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate (20). This method is used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate (20). An apparatus (4) for depositing a UV filter coating on a polymeric substrate comprises a plasma generator (10) having an anode (19) and a cathode (13) to form a plasma, and a first inlet (12) for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate (20) by the plasma (50). Optionally, an injection nozzle (18) can be utilized to provide a controlled delivery of the first reactant into the plasma (50).</p>
申请公布号 WO2000055388(A2) 申请公布日期 2000.09.21
申请号 US2000003028 申请日期 2000.02.04
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