发明名称 METHOD OF CRYSTAL GROWTH, METHOD OF FORMING FINE SEMICONDUCTOR STRUCTURE, SEMICONDUCTOR DEVICE, AND SYSTEM
摘要 <p>A method of crystal growth for producing a compound crystal material containing about several percentages nitrogen, such as a compound crystal semiconductor material comprising one or more Group III elements, nitrogen, and one or more Group V elements other than nitrogen, typically GaInNAs, which comprises conducting crystal growth under such conditions that a nitrogen source is utilized at a high efficiency. The method, in which a compound crystal containing nitrogen as a component thereof is formed, is characterized by using ammonia (NH3) as a nitrogen source and adding aluminum. The aluminum accelerates the decomposition/adsorption of the ammonia and thereby improves the efficiency of introduction of nitrogen into the crystal.</p>
申请公布号 WO0055398(A1) 申请公布日期 2000.09.21
申请号 WO2000JP01688 申请日期 2000.03.17
申请人 SHARP KABUSHIKI KAISHA;TAKAHASHI, KOJI;TOMOMURA, YOSHITAKA;KAWANISHI, HIDENORI 发明人 TAKAHASHI, KOJI;TOMOMURA, YOSHITAKA;KAWANISHI, HIDENORI
分类号 C30B23/02;C30B25/02;(IPC1-7):C30B29/40 主分类号 C30B23/02
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