METHOD FOR PRODUCING A PATTERN SUITABLE FOR FORMING SUB-MICRON WIDTH METAL LINES
摘要
The present invention relates to a process for providing a pattern on a substrate for use in a metal lift-off process, the process comprising: 1) coating a substrate with a liquid positive photoresist; 2) soft baking the coated substrate; 3) contacting the substrate with an aqueous alkaline developer containing from about 0.005 volume percent to about 0.05 volume percent of an alkylene glycol alkyl ether; 4) placing a patterned mask over the substrate; 5) exposing the substrate through the mask; 6) post exposure baking the substrate; 7) optionally, flood exposing the substrate; and 8) developing the substrate with an aqueous alkaline developer. The invention also relates to a novel developer solution of an ammonium hydroxide containing from about 0.005 volume percent to about 0.5 volume percent of an alkylene glycol alkyl ether and to a process for producing such a novel developer solution.
申请公布号
WO0055691(A1)
申请公布日期
2000.09.21
申请号
WO2000EP01831
申请日期
2000.03.03
申请人
CLARIANT INTERNATIONAL LTD.;CLARIANT FINANCE (BVI) LIMITED
发明人
REDD, RANDY, D.;DAMMEL, RALPH, R.;SAGAN, JOHN, P.;SPAK, MARK, A.