BARIUM DOPING OF MOLTEN SILICON FOR USE IN CRYSTAL GROWING PROCESS
摘要
A process for preparing doped molten silicon for use in a single silicon crystal growing process is disclosed. Polysilicon is doped with barium and melted in a silica crucible containing less than about 0.5 % gasses insoluble in silicon. During melting and throughout the crystal growing process the barium acts as a devitrification promoter and creates a layer of devitrified silica on the inside crucible surface in contact with the melt resulting in a lower level of contaminants in the melt and grown crystal.
申请公布号
WO0055394(A1)
申请公布日期
2000.09.21
申请号
WO2000US06565
申请日期
2000.03.14
申请人
MEMC ELECTRONIC MATERIALS, INC.
发明人
PHILLIPS, RICHARD, J.;KELTNER, STEVEN, J.;HOLDER, JOHN, D.