发明名称 BARIUM DOPING OF MOLTEN SILICON FOR USE IN CRYSTAL GROWING PROCESS
摘要 A process for preparing doped molten silicon for use in a single silicon crystal growing process is disclosed. Polysilicon is doped with barium and melted in a silica crucible containing less than about 0.5 % gasses insoluble in silicon. During melting and throughout the crystal growing process the barium acts as a devitrification promoter and creates a layer of devitrified silica on the inside crucible surface in contact with the melt resulting in a lower level of contaminants in the melt and grown crystal.
申请公布号 WO0055394(A1) 申请公布日期 2000.09.21
申请号 WO2000US06565 申请日期 2000.03.14
申请人 MEMC ELECTRONIC MATERIALS, INC. 发明人 PHILLIPS, RICHARD, J.;KELTNER, STEVEN, J.;HOLDER, JOHN, D.
分类号 C30B29/06;C30B15/00;C30B15/10 主分类号 C30B29/06
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